Abstract

Proximity-compensated, as well as uncompensated, blazed transmission gratings with periods of 4, 8, and 16 μm were manufactured with direct-writing, electron-beam lithography in positive resist. The compensated gratings performed better than the uncompensated ones. For the 4-μm compensated grating the measured diffraction efficiency was 67%. It was 35% for the uncompensated grating. The compensation was made by repeated convolutions in the spatial domain with the electron-beam point spread function. We determined this function by retrieving the phase from the measured diffraction pattern of the uncompensated gratings.

© 1994 Optical Society of America

Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms

Fredrik Nikolajeff, Jörgen Bengtsson, Michael Larsson, Mats Ekberg, and Sverker Hård
Appl. Opt. 34(5) 897-903 (1995)

Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

Michael Larsson, Mats Ekberg, Fredrik Nikolajeff, and Sverker Hård
Appl. Opt. 33(7) 1176-1179 (1994)

Direct inclusion of the proximity effect in the calculation of kinoforms

Jörgen Bengtsson
Appl. Opt. 33(22) 4993-4996 (1994)

Optimization of diffraction grating profiles in fabrication by electron-beam lithography

Masato Okano, Hisao Kikuta, Yoshihiko Hirai, Kazuya Yamamoto, and Tsutom Yotsuya
Appl. Opt. 43(27) 5137-5142 (2004)

High-efficiency blazed diffractive optical elements for the violet wavelength fabricated by electron-beam lithography

Teruhiro Shiono, Tetsuya Hamamoto, and Koji Takahara
Appl. Opt. 41(13) 2390-2393 (2002)