Abstract

The thickness-dependent optical and thermal properties and the corresponding damage thresholds have been investigated by means of various photothermal techniques on titanium dioxide thin films prepared by the conventional techniques of reactive electron-beam evaporation and reactive low-voltage ion plating (RLVIP). Compared with the reactive-electron-beam-evaporated samples, the RLVIP films exhibit a higher absorption, lower damage threshold, better thermal conductivity, lower defect density, and an almost perfect stability under Ar⁺-laser irradiation. These results are correlated with data from a multimethod approach, and a mechanism is proposed to explain the low damage threshold for the RLVIP TiO₂ films.

© 1994 Optical Society of America

Comparative study of titanium dioxide thin films produced by electron-beam evaporation and by reactive low-voltage ion plating

K. Balasubramanian, X. F. Han, and K. H. Guenther
Appl. Opt. 32(28) 5594-5600 (1993)

Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering

Laurent Gallais, Jérémie Capoulade, Jean-Yves Natoli, Mireille Commandré, Michel Cathelinaud, Cian Koc, and Michel Lequime
Appl. Opt. 47(13) C107-C113 (2008)

Optical waveguide characterization of dielectric films deposited by reactive low-voltage ion plating

Thomas C. Kimble, Marc D. Himel, and Karl H. Guenther
Appl. Opt. 32(28) 5640-5644 (1993)

Absorption and thermal conductivity of oxide thin films measured by photothermal displacement and reflectance methods

Z. L. Wu, M. Reichling, X.-Q. Hu, K. Balasubramanian, and K. H. Guenther
Appl. Opt. 32(28) 5660-5665 (1993)

Emission spectroscopy of reactive low-voltage ion plating for metal-oxide thin films

S. Zarrabian, C. Lee, and K. H. Guenther
Appl. Opt. 32(28) 5606-5611 (1993)