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Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics

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Abstract

The development of multilayer mirror technology capable of operating in the range of 3–30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach–Zehnder interferometer operating at 15.5 nm. We have tested this interferometer by using a soft x-ray laser as a source, and we show its use in probing high-density plasmas.

© 1995 Optical Society of America

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