Abstract

We propose the use of binary slanted surface-relief gratings with parallel-groove walls as input and output couplers in a planar optical interconnect. Parametric optimization of cascaded output couplers is employed to design an interconnect consisting of N output couplers producing a uniform intensity distribution with a high efficiency that may be realized in one lithographic etching step. The sensitivity of a N = 4 interconnect to various fabrication errors is analyzed. We demonstrate the operation of a slanted surface-relief grating manufactured with electron-beam lithography and reactive-ion etching for an operating wavelength of λ = 0.633 μm.

© 1997 Optical Society of America

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