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Surface relief zone plates fabricated with photographic emulsions

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Abstract

The use of photographic emulsions as a photoresist medium for fabricating relief blazed zone plates is described. Lithographic methods with masks with 256 gray levels were used in the fabrication process. An example of a zone plate working in the reflection mode at 45° and having 82% diffraction efficiency is shown.

© 1998 Optical Society of America

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