Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings

Josep Ferré-Borrull; Angela Duparré; Etienne Quesnel

doi:10.1364/AO.40.002190

Applied Optics
Vol. 40,
Issue 13,
pp. 2190-2199
(2001)
•https://doi.org/10.1364/AO.40.002190

Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings

Josep Ferré-Borrull, Angela Duparré, and Etienne Quesnel

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
Josep Ferré-Borrull, Angela Duparré, and Etienne Quesnel, "Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings," Appl. Opt. 40, 2190-2199 (2001)

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

A method for characterizing the microroughness of samples in optical coating technology is developed. Measurements over different spatial-frequency ranges are composed into a single power spectral density (PSD) covering a large bandwidth. This is followed by the extraction of characteristic parameters through fitting of the PSD to a suitable combination of theoretical models. The method allows us to combine microroughness measurements performed with different techniques, and the fitting procedure can be adapted to any behavior of a combined PSD. The method has been applied to a set of ion-beam-sputtered fluoride vacuum-UV coatings with increasing number of alternative low- and high-index layers. Conclusions about roughness development and microstructural growth are drawn.

Full Article | PDF Article

More Like This

Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

Josep Ferré-Borrull, Angela Duparré, and Etienne Quesnel
Appl. Opt. 39(31) 5854-5864 (2000)

Ultraviolet optical and microstructural properties of MgF₂ and LaF₃ coatings deposited by ion-beam sputtering and boat and electron-beam evaporation

Detlev Ristau, Stefan Günster, Salvador Bosch, Angela Duparré, Enrico Masetti, Josep Ferré-Borrull, George Kiriakidis, Francesca Peiró, Etienne Quesnel, and Alexander Tikhonravov
Appl. Opt. 41(16) 3196-3204 (2002)

Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering

Toshiya Yoshida, Keiji Nishimoto, Keiichi Sekine, and Kazuyuki Etoh
Appl. Opt. 45(7) 1375-1379 (2006)

Previous Article Next Article

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (9)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (5)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (11)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Component	Substrate	Layers	Aggregates

Model	Fractal	ABC	Shifted Gaussian
Characteristic parameters	K = 1150.00 nm^3-n	σ_ABC = 0.73 nm	σ_s = 0.19 nm
	n = 1.00	τ_ABC = 3.68 nm	τ_s = 173.10 nm
		C = 5.43	f _s = 2.86 µm^-1

Optical Thickness (QWOT)a	FS Substrate		CaF₂ Substrate
Optical Thickness (QWOT)a	QWb Designs	HWc Designs	QW Designs	HW Designs
1	S/L		S/L, S/H
2	S/L/H	S/2L	S/L/H	S/2H
3	S/L/H/L		S/L/H/L
4				S/2L/2H
6	S/(L/H)³	S/2L/2H/2L		S/2L/2H/2L
7	S/(L/H)³/L
10	S/(L/H)⁵	S/2L/2H/2L/2H/2L
20	S/(L/H)¹⁰		S/(L/H)¹⁰	S/(2L/2H)⁵

Design	Model
	ABC			Shifted Gaussian
	σ_ABC (nm)	τ_ABC (nm)	C	σ_s (nm)	τ_s (nm)	f _s (µm^-1)
S/L	0.45	9.35	6.41
S/L/H	0.47	8.37	7.20
S/L/H/L	0.72	11.66	9.10	0.19	173.10	3.45
S/(L/H)³	1.05	11.66	6.43	0.20	260.60	1.93
S/(L/H)³L	1.13	13.14	6.87	0.23	186.68	2.32
S/(L/H)⁵	1.34	13.42	6.13	0.19	226.06	1.70
S/(L/H)¹⁰	1.81	18.60	4.81	0.22	237.14	1.53
S/2L	0.66	10.98	8.06
S/2L/2H	1.12	14.96	4.14	0.53	270.09	1.64
S/2L/2H/2L/2H/2L	1.52	14.84	4.12	0.42	331.29	1.07

Design	Model
	ABC			Shifted Gaussian
	σ_ABC (nm)	τ_ABC (nm)	C	σ_s (nm)	τ_s (nm)	f _s (µm^-1)
S/L	0.42	7.58	7.25
S/L/H	0.43	9.10	5.77
S/L/H/L	0.73	9.88	5.43	0.25	160.22	2.86
S/(L/H)¹⁰	1.71	21.18	5.27	0.21	170.96	0.60
S/2L/2H	0.75	13.11	9.16	0.14	152.17	3.97
S/2L/2H/2L	1.05	12.40	7.66	0.06	253.30	2.23
S/(2L/2H)⁵	1.96	17.92	5.19	0.02	1126.04	0.94
S/H	0.45	22.54	3.32
S/2H	0.24	39.89	7.06	0.24	169.95	2.11

Substrate	K (nm^3-n)	n
FS	337.30	1.05
CaF₂	980.31	1.24

Abstract

Cited By

Figures (9)

Tables (5)

Equations (11)

Applied Optics