Abstract
Optically high quality coatings of fluoride materials are required in deep ultraviolet (DUV) lithography. We have applied ion-beam sputtering (IBS) to obtain fluoride films with smooth surfaces. The extinction coefficients were of the order of at the wavelength of due to the reduction of their absorption loss. The transmittance of the antireflection coating was as high as 99.7% at the wavelength of . The surfaces of the IBS deposited films were so smooth that the surface roughness of the film was comparable with that of the substrate. The coating fulfilled the temperature and humidity requirements of military specification. Thus, the IBS deposited fluoride films are promising candidate for use in the DUV lithography optics.
© 2006 Optical Society of America
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