Abstract

Capacitive grids and similar structures, to be used as reflectors in far ir interference filters, are prepared from a 1-μ thick copper layer supported by a 2.5-μ thick dielectric film. The desired pattern is obtained by simple photolithographic contact printing of a suitable negative. The essential steps of this preparation and the generation of some relevant patterns are described.

© 1969 Optical Society of America

Far Infrared Interference Filters

S. P. Varma and K. D. Möller
Appl. Opt. 8(8) 1663-1666 (1969)

Far-infrared bandpass filters from cross-shaped grids

V. P. Tomaselli, D. C. Edewaard, P. Gillan, and K. D. Möller
Appl. Opt. 20(8) 1361-1366 (1981)

Far Infrared Bandpass Filters and Measurements on a Reciprocal Grid

G. M. Ressler and K. D. Möller
Appl. Opt. 6(5) 893-896 (1967)

Interference Filters for the Far Infrared

Reinhard Ulrich
Appl. Opt. 7(10) 1987-1996 (1968)

The Design and Preparation of Induced Transmission Filters

R. J. Holloway and P. H. Lissberger
Appl. Opt. 8(3) 653-660 (1969)