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Optica Publishing Group
  • Chinese Optics Letters
  • Vol. 3,
  • Issue 7,
  • pp. 425-427
  • (2005)

Investigation of ultra-short-period W/C multilayers for soft X-ray optics

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Abstract

Ultra-short-period W/C multilayers having periodic thickness range of 1.15---3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers were characterized by low-angle X-ray diffraction (LAXRD) and transmission electron microscope (TEM). The results show that the multilayer thin films with periodic thickness more than 1.5 nm have clear W-C interface and low roughness. But the structure of the periodic thickness below 1.5 nm is not clear. Finally, three ways to improve the performance of the multilayers are suggested.

© 2005 Chinese Optics Letters

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