Abstract
The impurities in two kinds of HfO<sub>2</sub> materials and in their corresponding single layer thin films were determined through glow discharge mass spectrum technology and secondary ion mass spectrometry (SIMS) equipment respectively. It was found that ZrO<sub>2</sub> was the main impurity in the two kinds of HfO<sub>2</sub> either in the original HfO<sub>2</sub> materials or in the electron beam deposited films. In addition, the difference of Zr content in the two kinds of HfO<sub>2</sub> single layer films was much larger than that of the other impurities such as Ti and Fe, which showed that it was just ZrO<sub>2</sub> that made the difference between the optical performance of the film products including the two kinds of HfO<sub>2</sub>. With these two kinds of HfO<sub>2</sub> and the same kind of SiO<sub>2</sub>, we deposited HfO<sub>2</sub>/SiO<sub>2</sub> multilayer reflective coatings at the wavelength of 266 nm. Experimental results showed that the reflectances of these two mirrors were about 99.85% and 99.15% respectively, which agreed well with the designed results what were based on the optical constants obtained from the corresponding single layer thin films.
© 2008 Chinese Optics Letters
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