Abstract

Plotting of ellipsometric functions can be avoided when the index of refraction of the film is known and when only thickness is to be determined. The ellipsometric equations can be simplified by assuming an angle of incidence equal to Brewster’s angle for the air-film interface. The simplification leads to a precise expression for thickness in terms of Δ and ψ and some parameters, which depend on the index and can be collected in computed tables.

© 1968 Optical Society of America

Simultaneous and Independent Determination of the Refractive Index and the Thickness of Thin Films by Ellipsometry*

K. Vedam, R. Rai, F. Lukes, and R. Srinivasan
J. Opt. Soc. Am. 58(4) 526-532 (1968)

Generalized Ellipsometric Method for the Absorbing Substrate Covered with a Transparent-Film System. Optical Constants of Silicon at 3655 Å*

Samuel S. So and K. Vedam
J. Opt. Soc. Am. 62(1) 16-23 (1972)

Changes in the Phase and Amplitude of Polarized Light Reflected from a Film-Covered Surface and Their Relations with the Film Thickness

A. N. Saxena
J. Opt. Soc. Am. 55(9) 1061-1067 (1965)

Determination of thickness and optical constants of thin films from photometric and ellipsometric measurements

Eduardo Elizalde, Jean Marc Frigerio, and Josette Rivory
Appl. Opt. 25(24) 4557-4561 (1986)

Determination of the Properties of Films on Silicon by the Method of Ellipsometry

R. J. Archer
J. Opt. Soc. Am. 52(9) 970-977 (1962)