Abstract

A new ellipsometric method based on the use of two azimuthal positions of the incident plane-polarized beam is described. The method can be used without a compensator and does not require accurate meaurement of the reflected light flux. The basic principle and practical feasibility of the method are discussed. A brief qualitative argument seems to indicate that the method may be useful for a wide range of values of tanψ and, if no compensator is used, for selected angles of incidence so that Δ is in the range 40°–60° (or, 120°–140°) or so. Some experimental results are also presented.

© 1972 Optical Society of America

Effect of a Thin Surface Film on the Ellipsometric Determination of Optical Constants*

D. K. Burge and H. E. Bennett
J. Opt. Soc. Am. 54(12) 1428-1433 (1964)

Generalized Ellipsometric Method for the Absorbing Substrate Covered with a Transparent-Film System. Optical Constants of Silicon at 3655 Å*

Samuel S. So and K. Vedam
J. Opt. Soc. Am. 62(1) 16-23 (1972)

Ellipsometric Method for the Determination of All the Optical Parameters of the System of an Isotropic Nonabsorbing Film on an Isotropic Absorbing Substrate. Optical Constants of Silicon*

K. Vedam, W. Knausenberger, and F. Lukes
J. Opt. Soc. Am. 59(1) 64-71 (1969)

New Method for Accurate Determination of Optical Constants

O. Hunderi
Appl. Opt. 11(7) 1572-1578 (1972)

Effects of Optical Anisotropy of Aggregated Silver Films on Ellipsometric Determination of n, k, and d

Tomuo Yamaguchi, Sadafumi Yoshida, and Akira Kinbara
J. Opt. Soc. Am. 62(5) 634-638 (1972)