Abstract

Conjugate wave-front generation by degenerate four-wave mixing has been employed to project images with submicrometer features onto photoresist-coated substrates. The developed patterns demonstrate a resolution of >800 line pairs per millimeter for 413-nm illumination, consistent with theoretical expectations. The patterns are not degraded by speckle or edge enhancement, and the magnification is within 0.1% of unity. Focusing is accomplished by a novel interferometric procedure.

© 1981 Optical Society of America

Influence of the wave-front correlation function and deterministic wave-front aberrations on the speckle image-reconstruction problem in the high-light-level regime

Richard Barakat and Peter Nisenson
J. Opt. Soc. Am. 71(11) 1390-1402 (1981)

Acoustic wave-front visualization by use of a Kösters prism in the optical Fresnel diffraction region

Yoshihiro Ohtsuka and Aris Tanone
J. Opt. Soc. Am. 71(7) 879-883 (1981)

Wave-front dislocations: topological limitations for adaptive systems with phase conjugation

N. B. Baranova, A. V. Mamaev, N. F. Pilipetsky, V. V. Shkunov, and B. Ya. Zel’dovich
J. Opt. Soc. Am. 73(5) 525-528 (1983)

Cross coupling and aliasing in modal wave-front estimation

Jan Herrmann
J. Opt. Soc. Am. 71(8) 989-992 (1981)

3D photolithography through light field projections

Hongjie Zhang and Sy-Bor Wen
Appl. Opt. 59(27) 8071-8076 (2020)