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Analysis of a phase-modulating recording mechanism in negative photoresist

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Abstract

We describe a process that produces an index-of-refraction modulation requiring no wet development. A negative photoresist, which is currently employed as a surface-modulating material in high-resolution photolithography, was used. This process may be useful in real-time optical recording. It could eventually be shown to be responsible for defects in high-resolution photolithography.

© 1981 Optical Society of America

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