Jaime Frejlich and Lucila H. D. Cescato, "Analysis of a phase-modulating recording mechanism in negative photoresist," J. Opt. Soc. Am. 71, 873-878 (1981)
We describe a process that produces an index-of-refraction modulation requiring no wet development. A negative photoresist, which is currently employed as a surface-modulating material in high-resolution photolithography, was used. This process may be useful in real-time optical recording. It could eventually be shown to be responsible for defects in high-resolution photolithography.
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In this table are shown some 18 selected experimental results. Three among these are shown graphically in Figs. 3–5. The experimental points are fitted to Eq. (6) looking for a maximum value for the correlation coefficient; then the parameters x0/2, A, and K are noted. The coefficient A depends largely on the choice of experimental time origin, which did not not necessarily correspond with the time origin in Eq. (6). The primary experimental data are the I1/I0 ratios as reported. These data are transformed into half optical modulation x/2 through Eq. (5). The latter data are processed in the form described above.
Table 2
Performance of KMR-747 Photoresist as a Real-Time Recording Materiala
Temperature (°C)
K (min−1)
Time for Reaching 90% of Final Modulation
20
8.5 × 10−5
27000 min
30
1 × 10−3
2300 min
40
1 × 10−2
230 min
50
0.1
23 min
60
0.69
3.3 min
70
4.75
0.5 min
80
29.0
4.0 sec
100
820
0.2 sec
K = a × exp(−b/T); a = 3.13 × 1028 min−1; b = 21971 K.
In this table are shown some 18 selected experimental results. Three among these are shown graphically in Figs. 3–5. The experimental points are fitted to Eq. (6) looking for a maximum value for the correlation coefficient; then the parameters x0/2, A, and K are noted. The coefficient A depends largely on the choice of experimental time origin, which did not not necessarily correspond with the time origin in Eq. (6). The primary experimental data are the I1/I0 ratios as reported. These data are transformed into half optical modulation x/2 through Eq. (5). The latter data are processed in the form described above.
Table 2
Performance of KMR-747 Photoresist as a Real-Time Recording Materiala
Temperature (°C)
K (min−1)
Time for Reaching 90% of Final Modulation
20
8.5 × 10−5
27000 min
30
1 × 10−3
2300 min
40
1 × 10−2
230 min
50
0.1
23 min
60
0.69
3.3 min
70
4.75
0.5 min
80
29.0
4.0 sec
100
820
0.2 sec
K = a × exp(−b/T); a = 3.13 × 1028 min−1; b = 21971 K.