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Projection imaging of 0.1-μm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-μm lines and spaces is observed in polymethylmethacrylate.
© 1991 Optical Society of America
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