Abstract

$\mathrm{Si}∕\mathrm{Gd}$ multilayers designed as narrowband reflective coatings near $63\mathrm{nm}$ were developed. The highest peak reflectance of 26.2% at a $5°$ incident angle was obtained at $62\mathrm{nm}$, and the spectral bandwidth was $7.3\mathrm{nm}$ FWHM. The fits for x-ray and extreme ultraviolet reflectance data of $\mathrm{Si}∕\mathrm{Gd}$ multilayers indicate the possibility of silicide formation at the $\mathrm{Si}–\mathrm{Gd}$ interfaces. ${\mathrm{B}}_4\mathrm{C}$, W, and $\mathrm{SiN}$ were deposited as interface barrier layers to improve the reflectance of $\mathrm{Si}∕\mathrm{Gd}$ multilayers. More than an 8% increase in reflectance was observed from the interface-engineered $\mathrm{Si}∕\mathrm{W}∕\mathrm{Gd}$ and $\mathrm{Si}∕{\mathrm{B}}_4\mathrm{C}∕\mathrm{Gd}$ multilayers.

© 2008 Optical Society of America

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