This presentation is a short account of the nature of the problem of defect detection on wafers, and the increasing role of physics in evolving techniques to address the problem.
© 2011 OSA
(000.0000) General : General
M. Vaez-Iravani, "Optical Inspection and Metrology in Semiconductor Manufacturing," in Imaging and Applied Optics, OSA Technical Digest (CD) (Optical Society of America, 2011), paper AITuC1.
References are not available for this paper.