Thin Film Silicon Solar Cell Fabricated at 100°C by High Density Plasma for Flexible Photovoltaic Application

Chang-Hong Shen; Jia-Min Shieh; Jia-Min Shieh; Hao-Chung Kuo; Jung Y. Huang; Wen-Chien Yu; Wen-Hsien Huang; Chao-Kei Wang; Chih-Wei Hsu; Yu-Hsin Lin; Hung-Yu Chiu; Bau-Tong Dai; Fu-Liang Yang

doi:10.1364/CLEO.2010.CMAA1

Conference on Lasers and Electro-Optics 2010
OSA Technical Digest (CD) (Optica Publishing Group, 2010),
paper CMAA1
•https://doi.org/10.1364/CLEO.2010.CMAA1

Thin Film Silicon Solar Cell Fabricated at 100°C by High Density Plasma for Flexible Photovoltaic Application

Chang-Hong Shen, Jia-Min Shieh, Hao-Chung Kuo, Jung Y. Huang, Wen-Chien Yu, Wen-Hsien Huang, Chao-Kei Wang, Chih-Wei Hsu, Yu-Hsin Lin, Hung-Yu Chiu, Bau-Tong Dai, and Fu-Liang Yang

Conference on Lasers and Electro-Optics 2010

San Jose, California United States
16–21 May 2010
ISBN: 978-1-55752-889-6

From the session
Advanced Concepts in Photovoltaics (CMAA)

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C. Shen, J. Shieh, H. Kuo, J. Y. Huang, W. Yu, W. Huang, C. Wang, C. Hsu, Y. Lin, H. Chiu, B. Dai, and F. Yang, "Thin Film Silicon Solar Cell Fabricated at 100°C by High Density Plasma for Flexible Photovoltaic Application," in Conference on Lasers and Electro-Optics 2010, OSA Technical Digest (CD) (Optica Publishing Group, 2010), paper CMAA1.

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Abstract

Record fabrication temperature, 100°C, of a single junction amorphous Si solar cell was demonstrated by a high-density plasma method. Present solar cell revealed conversion efficiency of 7.4% at 200°C (4.1% at 135°C).

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