Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Finding defects in a 22 nm node wafer with visible light

Not Accessible

Your library or personal account may give you access

Abstract

Despite a diffraction limited lateral resolution of 360 nm, we detected 20 nm by 110 nm defects in a patterned 22 nm node wafer using quantitative phase and amplitude images from epi-illumination diffraction phase microscopy.

© 2013 Optical Society of America

PDF Article
More Like This
Finding defects in a 22 nm node wafer with visible light

Renjie Zhou, Gabriel Popescu, and Lynford L. Goddard
AF2J.2 CLEO: Science and Innovations (CLEO:S&I) 2013

Finding the Needle in the Haystack - Approaches for Detecting Small Defects on a Large Object

Kay Gastinger and Wolfgang Osten
ATu2B.1 Applied Industrial Optics: Spectroscopy, Imaging and Metrology (AIO) 2013

3.22-Gb/s WDM Visible Light Communication of a Single RGB LED Employing Carrier-Less Amplitude and Phase Modulation

Fang-Ming Wu, Chun-Ting Lin, Chia-Chien Wei, Cheng-Wei Chen, Zhen-Yu Chen, and Hou-Tzu Huang
OTh1G.4 Optical Fiber Communication Conference (OFC) 2013

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved