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Conferences > DOMO > 2000 > DMC > DMC3

Resistless direct laser writing technology for binary and gray-scale microimages generation

A. G. Poleshchuk, V. P. Korolkov, V. P. Koronkevich, V. V. Cherkashin, and C. Wu

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Abstract

Technologies of fabrication of gray-scale and binary masks for diffractive optics have been developed. Their peculiarity consists in application of materials changing chemical or optical properties under thermal action of laser beam without photoresist processing. Chromium and silicon films, LDW-glass are used as light-sensitive materials.

© 2000 Optical Society of America

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