Abstract

The iterative Fourier-transform algorithm (IFTA) has been widely used in the design of computer-generated holograms (CGHs) and diffractive optical elements [1]. However, the IFTA becomes computationally expensive when the size of the CGH to design is larger than 512 × 512 pixels per period. On the other hand, modern lithographic techniques as electron-beam (e-beam) lithography provide to the CGH an extremely large number of degrees of freedom whose exploitation during the numerical design is of great importance [2-4].

© 2002 Optical Society of America