Microscopic Cascading Induced by Local-Field Effects as a Tool for Quantum Lithography

Ksenia Dolgaleva; Heedeuk Shin; Robert W. Boyd; J. E. Sipe

doi:10.1364/ICQI.2008.JMB47

International Conference on Quantum Information
(Optica Publishing Group, 2008),
paper JMB47
•https://doi.org/10.1364/ICQI.2008.JMB47

Microscopic Cascading Induced by Local-Field Effects as a Tool for Quantum Lithography

Ksenia Dolgaleva, Heedeuk Shin, Robert W. Boyd, and J. E. Sipe

International Conference on Quantum Information 2008

Boston, Massachusetts United States
13–16 July 2008
ISBN:

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K. Dolgaleva, H. Shin, R. W. Boyd, and J. E. Sipe, "Microscopic Cascading Induced by Local-Field Effects as a Tool for Quantum Lithography," in International Conference on Quantum Information, (Optica Publishing Group, 2008), paper JMB47.

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Abstract

We show that there are cascaded contributions from the third-order microscopic hyperpolarizability to the fifth-order susceptibility induced by local-field effects which can be useful in creating novel quantum lithographic materials.

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