We present the first implementation of double-helix phase masks for 3D microscopy with high photon collection efficiency. The mask is fabricated using gray-level mask-less lithography. The system demonstrates precise 3D tracking of quantum dots.
© 2011 OSA
S. Quirin, G. Grover, C. Fiedler, and R. Piestun, "Double-Helix PSF Microscopy with a Phase Mask for Efficient Photon Collection," in Optics in the Life Sciences, OSA Technical Digest (CD) (Optical Society of America, 2011), paper NMB3.
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