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Conferences > OFT > 2000 > OMB > OMB1

Advanced Technology for Deep Precision Aspheres Fabrication with High Convergence - Demonstration of the Processing Cycle

Axel Schindler, Georg Boehm, Wilfried Frank, Thomas Haensel, Andreas Nickel, Frieder Bigl, and Martin Weiser

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Abstract

Deep precision asphere fabrication has been demonstrated by three advanced technologies: high rate figuring by Plasma Jet Chemical Etching (PJCE) or Radical Jet Etching (RJE) respectively, Computer Controlled Polishing (CCP) and Ion Beam Figuring (IBF).

© 2000 Optical Society of America

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