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  • International Optical Design Conference and Optical Fabrication and Testing
  • OSA Technical Digest (CD) (Optica Publishing Group, 2010),
  • paper OTuC4
  • https://doi.org/10.1364/OFT.2010.OTuC4

Characterization of Photoresist and Study on Developed Resist Profile for the Fabrication of Gray-Scale Diffractive Optic Elements

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Abstract

We have characterized photoresist used for fabrication of gray-scale diffractive optic elements using Dill’s and Mack’s parameters. Using the fast-marching method, simulations of resist profiles have been shown to match experimental results.

© 2010 OSA, SPIE

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