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Float-polishing process and analysis of float-polished quartz

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Abstract

A fluid-mechanical model is developed for the float-polishing process. In this model laminar flow between the sample and the lap results in pressure gradients at the grooves that support the sample on a fluid layer. The laminar fluid motion also produces supersmooth, damage-free surfaces. Quartz substrates for applications in high-stress environments were float polished, and their surfaces were analyzed by optical scatterometry, photoacoustic spectroscopy, and atomic force microscopy. The removal of 100 μm of material by a lapping–polishing process, with final float polishing, left low levels of subsurface damage, with a surface roughness of approximately 0.2-nm rms.

© 1994 Optical Society of America

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