Abstract

Titanium oxide $\left({\mathrm{T}\mathrm{i}\mathrm{O}}_2\right)$ thin films were prepared by different deposition methods. The methods were E-gun evaporation with ion-assisted deposition (IAD), radio-frequency (RF) ion-beam sputtering, and direct current (DC) magnetron sputtering. Residual stress was released after annealing the films deposited by RF ion-beam or DC magnetron sputtering but not evaporation, and the extinction coefficient varied significantly. The surface roughness of the evaporated films exceeded that of both sputtered films. At the annealing temperature of $300\text{\hspace{0.17em} °}\mathrm{C}$, anatase crystallization occurred in evaporated film but not in the RF ion-beam or DC magnetron-sputtered films. ${\mathrm{T}\mathrm{i}\mathrm{O}}_2$ films deposited by sputtering were generally more stable during annealing than those deposited by evaporation.

© 2008 Optical Society of America

Investigation of thermal annealing of optical properties and residual stress of ion-beam-assisted TiO₂ thin films with different substrate temperatures

Cheng-Chung Lee, Hsi-Chao Chen, and Cheng-Chung Jaing
Appl. Opt. 45(13) 3091-3096 (2006)

Effect of thermal annealing on the optical properties and residual stress of TiO₂ films produced by ion-assisted deposition

Cheng-Chung Lee, Hsi-Chao Chen, and Cheng-Chung Jaing
Appl. Opt. 44(15) 2996-3000 (2005)

Effects of annealing on the optical, structural, and chemical properties of TiO₂ and MgF₂ thin films prepared by plasma ion-assisted deposition

Seouk-Hoon Woo and Chang Kwon Hwangbo
Appl. Opt. 45(7) 1447-1455 (2006)

Optical properties and residual stress of YbF₃ thin films deposited at different temperatures

Ying Wang, Yue-guang Zhang, Wei-lan Chen, Wei-dong Shen, Xu Liu, and Pei-fu Gu
Appl. Opt. 47(13) C319-C323 (2008)

TiO₂-Ta₂O₅ composite thin films deposited by radio frequency ion-beam sputtering

Cheng-Chung Lee and Chien-Jen Tang
Appl. Opt. 45(36) 9125-9131 (2006)