Abstract

We report the implementation and operation of novel superhigh-reflectivity negative-dispersion dielectric mirrors for use in tunable ultrafast laser systems. The mirror structure is divided into two distinct regions: an underlying superhigh-reflectivity dielectric quarter-wavelength stack and an overlying negative-dispersion section consisting of only a few layers and forming simple multiple Gires–Tournois interferometers. The example that we present was designed for operation from 800 to 900 nm and has a near-constant group-delay dispersion of $-40 {\mathrm{fs}}^2$ and a peak reflectivity greater than 99.99%. We show a comparison of the predicted and the measured mirror performance and application of these mirrors in a mode-locked Ti:sapphire laser tunable from 805 to 915 nm.

© 2000 Optical Society of America

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