Abstract

We report on the use of dielectric coatings to improve the contrast of longitudinal magneto-optic Kerr effect signals from submicron magnetic structures. Electron-beam lithography was used to define disks in 22 nm thick Ni films deposited on Si substrates. The structures were measured in four configurations: as-deposited, through a fused silica prism using index-matching fluid, coated with ZnS, and using a prism on top of the ZnS layer. The modified samples show up to 20 times improvement in the MOKE contrast due to admittance matching to the magnetic material and suppression of the substrate reflectance. The behavior is successfully predicted by a model that includes the magneto-optic response of the nickel layer and accounts for the fraction of the beam intercepted by the magnetic structure.

© 2006 Optical Society of America

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History
Original Manuscript: October 4, 2006
Manuscript Accepted: December 7, 2006
Revised Manuscript: December 1, 2006
Published: December 22, 2006

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Author Affiliations

L. F. Holiday, U. J. Gibson

Dartmouth College

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