Abstract

A deeper understanding of imaging behavior is needed with the widespread adoption of optical proximity correction in advanced lithography processes. To gain insight into the printing behavior of different mask pattern configurations, we derive edge-based and vertex-based image models by combining concepts contained in the geometrical theory of diffraction and Hopkins’s image model. The models are scalar models and apply to planar, perfectly conducting mask objects.

© 2004 Optical Society of America

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Author Affiliations

Byoung-Il Choi

Chartered Semiconductor Manufacturing, 60 Woodlands Industrial Park D, Street 2, Singapore 738406

Andrew Khoh, Ganesh S. Samudra, Yihong Wu

National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260

Tom Milster

Optical Sciences Center, University of Arizona, Tucson, Arizona 85721

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