A GaN surface-grating reflector has been designed and fabricated. The grating structure was optimized by the rigorous coupled-wave analysis, which was followed by the fabrication using holographic lithography. Reflectance measurements revealed that the grating was highly polarization-dependent, its reflectance exceeding 90% over the spectral bandwidth of 60 nm for TE-polarization.
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J. Lee, S. Ahn, H. Jang, and H. Jeon, "Polarization-Dependent GaN Grating Reflector," in Asia Communications and Photonics Conference and Exhibition, Technical Digest (CD) (Optical Society of America, 2009), paper TuH1.
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