InP nano inner cladding fiber was fabricated by the means of MCVD. The thickness of the InP film is about 60nm. The electric field distribution is simulated through the FEM. It is shown that the InP nano film can confine the electric distribution in the core and the neff=1.585.
© OSA, IEEE Photonics Society, SPIE, COS, CIC
(220.0220) Optical design and fabrication : Optical design and fabrication
(310.0310) Thin films : Thin films
(310.6860) Thin films : Thin films, optical properties
(220.4241) Optical design and fabrication : Nanostructure fabrication
Y. Duan, R. Zhang, P. Lang, and J. Wang, "Finite Element Analysis of InP Nano Inner Cladding Fiber," in Asia Communications and Photonics Conference and Exhibition, Technical Digest (CD) (Optical Society of America, 2009), paper WL24.