Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > ACPC > 2014 > ATh1B > ATh1B.3

Realize the Concentric Circles Pattern based on Two-Surface-Plasmon-Polariton Absorption Photolithography

Weisi Meng, Fang Liu, Weijun Zhang, Yu Ye, and Yidong Huang

Not Accessible

Your library or personal account may give you access

Abstract

Based on a photolithography method with two-surface-plasmon-polariton-absorption effect, a concentric-circle pattern with linewidth of ~70nm is realized under the exposure of 400nm femtosecond laser. The pattern is promising of realizing optical devices of light field gathering or bio-sensing.

© 2014 Optical Society of America

PDF Article
More Like This
Nano-patterning based on Two-Surface-Plasmon-Polariton-Absorption using 400nm Femtosecond Laser

Yunxiang Li, Fang Liu, Weisi Meng, and Yidong Huang
JTu4A.8 CLEO: Applications and Technology (CLEO:A&T) 2014

Nanolithography based on Two-Surface-Plasmon-Polariton-Absorption

Yunxiang LI, Fang LIU, Long XIAO, and Yidong HUANG
QW1N.4 CLEO: QELS_Fundamental Science (CLEO:FS) 2013

Terahertz surface plasmon polaritons imaging system

Yan Zhang, Xinke Wang, and Sen Wang
TuS4_4 International Symposium on Ultrafast Phenomena and Terahertz Waves (ISUPTW) 2014

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use