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Conference Paper
Adaptive Optics: Methods, Analysis and Applications
Charlotte, North Carolina United States
June 6, 2005
ISBN: 1-55752-789-X
Joint AO/IP Poster Session/Conference Reception (JWB)

Parallel Fabrication of Photonic Crystals (PC) Using Interference Lithography for Integrated Waveguide-PC Devices

Ashwin Chincholi, Siddhartha Banerjee, Jia-Sheng Huang, and David Klotzkin

http://dx.doi.org/10.1364/AOPT.2005.JWB10


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Abstract

Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.

© 2005 Optical Society of America

OCIS Codes
(090.0090) Holography : Holography
(090.2880) Holography : Holographic interferometry
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography

Citation
A. Chincholi, S. Banerjee, J. Huang, and D. Klotzkin, " Parallel Fabrication of Photonic Crystals (PC) Using Interference Lithography for Integrated Waveguide-PC Devices," in Adaptive Optics: Analysis and Methods/Computational Optical Sensing and Imaging/Information Photonics/Signal Recovery and Synthesis Topical Meetings on CD-ROM, Technical Digest (Optical Society of America, 2005), paper JWB10.
http://www.opticsinfobase.org/abstract.cfm?URI=AOPT-2005-JWB10


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