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Conference Paper
Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides
Monterey, California United States
September 1, 2003
ISBN: 1-55752-736-9
Photosensitivity and Chemistry (MC)

The effect of UV lasers treatment on atomic (low frequency) and electronic (high frequency) parts of refractive index in silicate photosensitive glasses

K M. Golant and O V. Butov

http://dx.doi.org/10.1364/BGPP.2003.MC1


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Abstract

A correct application of the Kramers-Kronig relation to analysis of the refractive index frequency dependence in silica glasses transparency window lets one distinguish between contributions of atomic and electronic components to photorefractive effect if the refractive index measurement inaccuracy does not exceed 10-4.

© 2003 Optical Society of America

OCIS Codes
(160.0160) Materials : Materials
(160.2750) Materials : Glass and other amorphous materials
(160.4760) Materials : Optical properties

Citation
K. M. Golant and O. V. Butov, "The effect of UV lasers treatment on atomic (low frequency) and electronic (high frequency) parts of refractive index in silicate photosensitive glasses," in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, Technical Digest (Optical Society of America, 2003), paper MC1.
http://www.opticsinfobase.org/abstract.cfm?URI=BGPP-2003-MC1


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