The effect of stress-relaxation when irradiation strikes the bi-material interface of a silica-on-silicon system using 193nm ArF laser and the importance of non-local stress-relaxation in determining negative index change is reported.
© 2003 Optical Society of America
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.2770) Diffraction and gratings : Gratings
(230.0230) Optical devices : Optical devices
(230.7390) Optical devices : Waveguides, planar
H. N. Fernando, L. Wosinski, B. Jaskorzynska, M. Dainese, and J. Canning, "UV-Induced non-local stress relaxation in bimaterial systems," in Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, Technical Digest (Optical Society of America, 2003), paper MD25.
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