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  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference
  • Technical Digest (Optica Publishing Group, 2003),
  • paper CTuL2

Generation of photonic crystal patterns by single-spot electron beam lithography

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Abstract

A new method of patterning photonic crystal (PhC) structures by single-spot electron-beam exposure scheme is presented. An order-of-magnitude reduction in the required job time compared to that for the conventional multi-spot scheme has been achieved.

© 2003 Optical Society of America

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