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Optica Publishing Group
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference
  • Technical Digest (Optica Publishing Group, 2003),
  • paper CTuL5

Controlling the feature size made by two-photon photopolymerization in a threshold material

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Abstract

The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.

© 2003 Optical Society of America

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