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Conference Paper
Conference on Lasers and Electro-Optics
San Francisco, California United States
May 16, 2004
ISBN: 1-55752-770-9
Ultrafast Laser Processing (CThD)

Scaling laws of femtosecond laser induced breakdown in dielectric films

Mark Mero, Jianhua Liu, Ali J. Sabbah, Joachim Zeller, Paul M. Alsing, John K. McIver, Jayesh Jasapara, and Wolfgang Rudolph

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Abstract

Measured pulse duration and band-gap scaling of the laser breakdown threshold in oxide dielectrics is explained by multiphoton and impact ionization, and relaxation. Formation of self-trapped excitons on a sub-ps time scale is observed.

© 2004 Optical Society of America

OCIS Codes
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.3330) Lasers and laser optics : Laser damage
(320.0320) Ultrafast optics : Ultrafast optics
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors

Citation
M. Mero, J. Liu, A. J. Sabbah, J. Zeller, P. M. Alsing, J. K. McIver, J. Jasapara, and W. Rudolph, "Scaling laws of femtosecond laser induced breakdown in dielectric films," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2004), paper CThD4.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO-2004-CThD4


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