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Conference Paper
Conference on Lasers and Electro-Optics
Baltimore, Maryland United States
May 22, 2005
ISBN: 1-55752-770-9
Femtosecond Micromaching II (CThCC)

3-D Fabrication of Microfluidic Channels in Fused Silica Using Focused Femtosecond Laser Beams and Selective Chemical Etching

Cyril Hnatovsky, Rod S. Taylor, Ravi Bhardwaj, Eli Simova, David M. Rayner, and Paul B. Corkum

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Abstract

We demonstrate polarization dependence of the etch rate in femtosecond laser fabrication of 3-D microfluidic channels. We also show the existence of an energy threshold at which etching becomes highly selective.

© 2005 Optical Society of America

OCIS Codes
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.3440) Lasers and laser optics : Laser-induced breakdown
(320.0320) Ultrafast optics : Ultrafast optics
(320.7110) Ultrafast optics : Ultrafast nonlinear optics

Citation
C. Hnatovsky, R. S. Taylor, R. Bhardwaj, E. Simova, D. M. Rayner, and P. B. Corkum, "3-D Fabrication of Microfluidic Channels in Fused Silica Using Focused Femtosecond Laser Beams and Selective Chemical Etching," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper CThCC2.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO-2005-CThCC2


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