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Conference Paper
Conference on Lasers and Electro-Optics
Baltimore, Maryland United States
May 22, 2005
ISBN: 1-55752-770-9
Laser Materials Processing (CThL)

Optical Properties of SiOx Nanostructured Films by Pulsed-Laser Deposition

Xiaoyu Chen and Yongfeng Lu

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Abstract

SiOx nanostructured films were formed by pulsed-laser deposition (PLD) of Si. The photoluminescence band at 1.6-2.1 eV shifts with ambient gas pressure, substrate temperature and post-deposition processing, which supports the quantum confinement effect theory.

© 2005 Optical Society of America

OCIS Codes
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.3390) Lasers and laser optics : Laser materials processing
(310.0310) Thin films : Thin films
(310.6860) Thin films : Thin films, optical properties

Citation
X. Chen and Y. Lu, "Optical Properties of SiOx Nanostructured Films by Pulsed-Laser Deposition," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper CThL4.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO-2005-CThL4


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