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Conference Paper
Conference on Lasers and Electro-Optics
Baltimore, Maryland United States
May 22, 2005
ISBN: 1-55752-770-9
Poster Session II (JWB)

Mask Design for the Space Interferometry Mission Internal Metrology

David Marx, Feng Zhao, and Robert Korechoff

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Abstract

Heterodyne laser interferometers are used to measure the changes in optical path length of the arms of stellar interferometers. Numerical diffraction analysis is used to design masks, constrained by diffraction, crosstalk, and power loss requirements.

© 2005 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1940) Diffraction and gratings : Diffraction
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3180) Instrumentation, measurement, and metrology : Interferometry

Citation
D. Marx, F. Zhao, and R. Korechoff, "Mask Design for the Space Interferometry Mission Internal Metrology," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JWB1.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO-2005-JWB1


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