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  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • Technical Digest (CD) (Optica Publishing Group, 2006),
  • paper CMHH3

Enhancement of Laser Nano-Patterning of Semiconductors: Direct Ablation of PMMA Coated Silicon

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Abstract

Sub-micron patterning of silicon is demonstrated by direct femtosecond laser ablation. An enhancement of the ablation rate and a reduction of debris formation are achieved by covering the surface with a PMMA layer prior to ablation.

© 2006 Optical Society of America

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