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Conference Paper
Conference on Lasers and Electro-Optics
Long Beach, California United States
May 21, 2006
ISBN: 1-55752-813-6
Laser Processing (CMP)

On-Chip Laser-Locking of Tritium in Silica Film Using Deep UV Laser Irradiation

Baojun Liu, Nazir P. Kherani, Stefan Zukotynski, and Kevin P. Chen

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Abstract

Tritium locking in silica film is demonstrated using a combination of high-pressure tritium loading and 248-nm KrF-laser irradiation. This work promises a safe and simple approach to integrate radioisotope micro-power source on-chip for micro-electronic applications.

© 2006 Optical Society of America

OCIS Codes
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.3390) Lasers and laser optics : Laser materials processing
(160.0160) Materials : Materials
(160.6030) Materials : Silica

Citation
B. Liu, N. P. Kherani, S. Zukotynski, and K. P. Chen, "On-Chip Laser-Locking of Tritium in Silica Film Using Deep UV Laser Irradiation," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2006), paper CMP2.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO-2006-CMP2


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