Tritium locking in silica film is demonstrated using a combination of high-pressure tritium loading and 248-nm KrF-laser irradiation. This work promises a safe and simple approach to integrate radioisotope micro-power source on-chip for micro-electronic applications.
© 2006 Optical Society of America
B. Liu, N. P. Kherani, S. Zukotynski, and K. P. Chen, "On-Chip Laser-Locking of Tritium in Silica Film Using Deep UV Laser Irradiation," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2006), paper CMP2.
References are not available for this paper.