A new domain of rapid waveguide writing using 50 to 1500 fs laser pulses is presented for fused silica. Type II photosensitivity mechanisms are inferred for the low-loss waveguides, imprinted with coarsely overlapping pulses.
© 2006 Optical Society of America
H. Zhang, S. Eaton, A. Hosseini, and P. R. Herman, "Low-Damage Type-II Waveguide Writing in Fused Silica With Femtosecond and Picosecond Lasers," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2006), paper CMX6.
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