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Conference Paper
Conference on Lasers and Electro-Optics
Long Beach, California United States
May 21, 2006
ISBN: 1-55752-813-6
Femtosecond Laser-Based Material Modification (CMX)

Low-Damage Type-II Waveguide Writing in Fused Silica With Femtosecond and Picosecond Lasers

Haibin Zhang, Shane Eaton, Abbas Hosseini, and Peter R. Herman

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A new domain of rapid waveguide writing using 50 to 1500 fs laser pulses is presented for fused silica. Type II photosensitivity mechanisms are inferred for the low-loss waveguides, imprinted with coarsely overlapping pulses.

© 2006 Optical Society of America

OCIS Codes
(160.0160) Materials : Materials
(160.2750) Materials : Glass and other amorphous materials
(320.0320) Ultrafast optics : Ultrafast optics
(320.2250) Ultrafast optics : Femtosecond phenomena

H. Zhang, S. Eaton, A. Hosseini, and P. R. Herman, "Low-Damage Type-II Waveguide Writing in Fused Silica With Femtosecond and Picosecond Lasers," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2006), paper CMX6.

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