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Conference Paper
Conference on Lasers and Electro-Optics
Long Beach, California United States
May 21, 2006
ISBN: 1-55752-813-6
Joint CLEO/QELS Poster Session I (JTuD)

Fabrication of Silicon 3D Photonic Crystal Structures in 100nm Scale Using Double Directional Etchings Method

Daihei Hippo, Yoshiyuki Kawata, Yoshishige Tsuchiya, Hiroshi Mizuta, Shunri Oda, Kei Urakawa, and Nobuyoshi Koshida

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Abstract

We have reported periodic pore formation with diameter in 80nm and aspect ratio above 250 on N+(100) silicon substrate and demonstrated the fabrication of silicon 3-dimensional microstructures by applying double directional etchings method.

© 2006 Optical Society of America

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography
(230.0230) Optical devices : Optical devices
(230.4000) Optical devices : Microstructure fabrication

Citation
D. Hippo, Y. Kawata, Y. Tsuchiya, H. Mizuta, S. Oda, K. Urakawa, and N. Koshida, "Fabrication of Silicon 3D Photonic Crystal Structures in 100nm Scale Using Double Directional Etchings Method," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2006), paper JTuD47.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO-2006-JTuD47


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