We have reported periodic pore formation with diameter in 80nm and aspect ratio above 250 on N+(100) silicon substrate and demonstrated the fabrication of silicon 3-dimensional microstructures by applying double directional etchings method.
© 2006 Optical Society of America
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography
(230.0230) Optical devices : Optical devices
(230.4000) Optical devices : Microstructure fabrication
D. Hippo, Y. Kawata, Y. Tsuchiya, H. Mizuta, S. Oda, K. Urakawa, and N. Koshida, "Fabrication of Silicon 3D Photonic Crystal Structures in 100nm Scale Using Double Directional Etchings Method," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2006), paper JTuD47.
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