Design and Analysis of Beam Apodizers Using Error Diffusion

C. Dorrer; J. D. Zuegel

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
Technical Digest (CD) (Optica Publishing Group, 2006),
paper JWD1

Design and Analysis of Beam Apodizers Using Error Diffusion

C. Dorrer and J. D. Zuegel

Conference on Lasers and Electro-Optics 2006

Long Beach, California United States
21–26 May 2006
ISBN: 1-55752-813-6

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C. Dorrer and J. D. Zuegel, "Design and Analysis of Beam Apodizers Using Error Diffusion," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optica Publishing Group, 2006), paper JWD1.

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Abstract

Beam apodization using binary amplitude masks designed with an error-diffusion algorithm is studied. High-shaping capability and predictability of mask properties is demonstrated for precompensation of the spatial gain variation of a glass amplifier.

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