Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ~ 60 nm FWHM were printed controlling the exposure dose.
© 2007 OSA
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
P. W. Wachulak, M. G. Capeluto, M. C. Marconi, C. S. Menoni, and J. J. Rocca, "Arrays of Sub-100 nm Features Fabricated with Table Top Extreme Ultraviolet Interferometric Laser Lithography," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest Series (CD) (Optical Society of America, 2007), paper CThCC3.
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