Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO > 2007 > CThN > CThN2
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest Series (CD) (Optica Publishing Group, 2007),
  • paper CThN2

Large-area Metal Grid Ultraviolet Filter Fabricated by Nanoimprint Lithography

Wen-Di Li and Stephen Y. Chou

Not Accessible

Your library or personal account may give you access

Abstract

For the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength.

© 2007 Optical Society of America

PDF Article
More Like This
Polymer photonic crystal band edge laser fabricated by nanoimprint lithography

V. Reboud, P. Lovera, N. Kehagias, M. Zelsmann, M. Fink, F. Reuther, G. Gruetzner, G. Redmond, and C. M. Sotomayor Torres
CK3_2 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2007

Soft UV-Nanoimprint lithography for the Fabrication of Frequency Selective Components

J. Viheriälä, J. Tommila, A. Laakso, S. Ranta, I. Vartiainen, H. Tuovinen, J. Telkkälä, T. Vallius, T. Niemi, M. Dumitrescu, and M. Pessa
CE7_4 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2009

Plasmonic color filters for large area display devices fabricated by laser interference lithography

Yun Seon Do, Jung-Ho Park, Bo Yeon Hwang, Sung-Min Lee, Byeong-Kwon Ju, and Kyung Cheol Choi
JW4A.119 CLEO: Applications and Technology (CLEO:A&T) 2012

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use