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Conference Paper
Conference on Lasers and Electro-Optics
Baltimore, Maryland United States
May 6, 2007
ISBN: 1557528349
Nanofabrication (CThN)

Electron-Beam Lithography Techniques for Micro- and Nano-Scale Surface Structure Current Injection Lasers

Guy A. DeRose, Lin Zhu, Joyce K. S. Poon, Amnon Yariv, and Axel Scherer

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Abstract

We demonstrate nanoscale patterning and overlay of two-dimensional gratings and waveguides with accuracy better than 45nm using electron-beam lithography for surface structure lasers with large areas.

© 2007 OSA

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication

Citation
G. A. DeRose, L. Zhu, J. K. S. Poon, A. Yariv, and A. Scherer, "Electron-Beam Lithography Techniques for Micro- and Nano-Scale Surface Structure Current Injection Lasers," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest Series (CD) (Optical Society of America, 2007), paper CThN7.
http://www.opticsinfobase.org/abstract.cfm?URI=CLEO-2007-CThN7

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