We demonstrate nanoscale patterning and overlay of two-dimensional gratings and waveguides with accuracy better than 45nm using electron-beam lithography for surface structure lasers with large areas.
© 2007 OSA
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
G. A. DeRose, L. Zhu, J. K. S. Poon, A. Yariv, and A. Scherer, "Electron-Beam Lithography Techniques for Micro- and Nano-Scale Surface Structure Current Injection Lasers," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest Series (CD) (Optical Society of America, 2007), paper CThN7.